A 600-V, 10-A trench bipolar junction diode with superior static and dynamic characteristics

Budong You*, Alex Q. Huang, Johnny K.O. Sin

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

3 Citations (Scopus)

Abstract

In this paper, 600-V, 10-A trench bipolar junction diodes (TBJDs) fabricated utilizing a new self-aligned trench process is characterized and reported. For the first time, the TBJD has experimentally demonstrated, compared to the conventional P-i-N diode, not only superior reverse recovery characteristics, but also lower on-state voltage drops and the unchanged reverse leakage current levels at elevated temperature. The relationship between the diode performance and the design parameters of the TBJD is also discussed in this paper.

Original languageEnglish
Pages (from-to)2143-2147
Number of pages5
JournalIEEE Transactions on Electron Devices
Volume48
Issue number9
DOIs
Publication statusPublished - Sept 2001

Keywords

  • Bipolar transistors
  • Polycrystalline silicon
  • Power diodes
  • Semiconductor device fabrication
  • Trench etching

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