Abstract
A novel fully integrated 3D TSV (Through-Silicon-Via) transformer is demonstrated for high-voltage signal transfer. The transformer is embedded in a silicon substrate, with primary coil connecting to the front-side through TSV interconnects, and with secondary coil flip-chip connected onto another substrate. Using this approach, complete 3D integration can be achievedwith ultimate area efficiency and the smallest possible form factor compared with conventional on-silicon approaches. A coreless transformer is fabricated within a small chip area of 0.5 mm2. It achieves both high galvanic isolation of <4 kV DC and high voltage gain of >?3 dB from 10-100 MHz.
| Original language | English |
|---|---|
| Pages (from-to) | Q29-Q31 |
| Journal | ECS solid state letters |
| Volume | 2 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2013 |
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