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A novel 6T SRAM cell with asymmetrically gate underlap engineered FinFETs for enhanced read data stability and write ability

  • Shairfemuhammad Salahuddin
  • , Hailong Jiao
  • , Volkan Kursun

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

Abstract

A new FinFET memory circuit technique based on asymmetrically gate underlap engineered bitline access transistors is proposed in this paper. The strengths of the asymmetrical bitline access transistors are weakened during read operations while enhanced during write operations as the direction of current flow is reversed. With the proposed asymmetrical six-FinFET SRAM cell, the read data stability and write ability are both enhanced by up to 6.12x and 58%, respectively, without causing any area overhead as compared to the standard symmetrical six-FinFET SRAM cells in a 15nm FinFET technology. The leakage power consumption is also reduced by up to 96.5% with the proposed asymmetrical FinFET SRAM cell as compared to the standard six-FinFET SRAM cells with symmetrical bitline access transistors.

Original languageEnglish
Title of host publicationProceedings of the 14th International Symposium on Quality Electronic Design, ISQED 2013
Pages353-358
Number of pages6
DOIs
Publication statusPublished - 2013
Event14th International Symposium on Quality Electronic Design, ISQED 2013 - Santa Clara, CA, United States
Duration: 4 Mar 20136 Mar 2013

Publication series

NameProceedings - International Symposium on Quality Electronic Design, ISQED
ISSN (Print)1948-3287
ISSN (Electronic)1948-3295

Conference

Conference14th International Symposium on Quality Electronic Design, ISQED 2013
Country/TerritoryUnited States
CitySanta Clara, CA
Period4/03/136/03/13

Keywords

  • asymmetrical gate underlap engineering
  • data stability
  • leakage power consumption
  • Memory
  • on-die cache
  • static noise margin
  • write margin

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