A novel RF high-Q metal-semiconductor-metal planar inter-digitated varactor based on double-channel AlGaN/GaN HEMT structure

Chun San Chu*, Yugang Zhou, Kevin J. Chen, Kei May Lau

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

1 Citation (Scopus)

Abstract

A novel GaN-based Double-Channel Metal-Semiconductor-Metal Configuration Planar Inter-Digitated varactor fabricated with HEMT compatible process is presented. Our varactors achieved high Q-factor, wide tuning range and high minimun Q-factor (Qmin). The double-channel heterostructure extends the useful high Q-factor capacitance tuning range of the varactors. The operation of the varactor is explained by a physical equivalent circuit, in which the whole changing trend of extracted Q-factors over bias voltage and extracted resistance can be explained. The measurement results of the novel double-channel varactors are compared with the varactors facbricated on single channel heterostructure in order to show its superior performances.

Original languageEnglish
Title of host publication2005 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Digest of Papers
EditorsA. Jerng
Pages385-388
Number of pages4
DOIs
Publication statusPublished - 2005
Event2005 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Digest of Papers - Long Beach, CA, United States
Duration: 12 Jun 200514 Jun 2005

Publication series

NameDigest of Papers - IEEE Radio Frequency Integrated Circuits Symposium
ISSN (Print)1529-2517

Conference

Conference2005 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Digest of Papers
Country/TerritoryUnited States
CityLong Beach, CA
Period12/06/0514/06/05

Keywords

  • AlGaN/GaN
  • C-V
  • Double channel
  • Equivalent circuit
  • Q-factor
  • Schottky contacts
  • Varactor

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