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A novel SONOS gate power MOSFET with excellent UIS capability

  • Xianda Zhou*
  • , Jacky C.W. Ng
  • , Johnny K.O. Sin
  • *Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

A novel silicon-oxide-nitride-oxide-silicon gate power MOSFET is proposed and experimentally demonstrated. In the novel device, the doping concentration of the p-body is increased by an order of magnitude compared to that of the conventional power MOSFET. However, the positive shift of the threshold voltage due to the heavily doped p-body is fully compensated by the positive fixed charges preprogrammed in the silicon nitride of the oxide-nitride-oxide gate dielectric. As a result, a normal threshold voltage can be obtained, and the avalanche energy absorption of the novel device at unclamped inductive switching is 5.2 times that of the conventional power MOSFET.

Original languageEnglish
Article number5982080
Pages (from-to)1415-1417
Number of pages3
JournalIEEE Electron Device Letters
Volume32
Issue number10
DOIs
Publication statusPublished - Oct 2011

Keywords

  • Avalanche energy
  • power MOSFET
  • silicon-oxide-nitride-oxide-silicon (SONOS)
  • threshold voltage
  • unclamped inductive switching (UIS)

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