Abstract
A novel silicon-oxide-nitride-oxide-silicon gate power MOSFET is proposed and experimentally demonstrated. In the novel device, the doping concentration of the p-body is increased by an order of magnitude compared to that of the conventional power MOSFET. However, the positive shift of the threshold voltage due to the heavily doped p-body is fully compensated by the positive fixed charges preprogrammed in the silicon nitride of the oxide-nitride-oxide gate dielectric. As a result, a normal threshold voltage can be obtained, and the avalanche energy absorption of the novel device at unclamped inductive switching is 5.2 times that of the conventional power MOSFET.
| Original language | English |
|---|---|
| Article number | 5982080 |
| Pages (from-to) | 1415-1417 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 32 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - Oct 2011 |
Keywords
- Avalanche energy
- power MOSFET
- silicon-oxide-nitride-oxide-silicon (SONOS)
- threshold voltage
- unclamped inductive switching (UIS)
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