Abstract
A physics-based MOSFET noise model that can accurately predict the noise characteristics over the linear, saturation, and subthreshold operating regions but is still simple enough to be implemented in any general-purpose circuit simulator has been developed. Expressions for the flicker noise power are derived on the basis of a theory that incorporates both the oxide-trap-induced carrier number and correlated surface mobility fluctuation mechanisms. The model is applicable to long-channel, as well as submicron n-and p-channel MOSFET’s fabricated by different technologies, and all the model parameters can be easily extracted from routine I–V and noise measurements.
| Original language | English |
|---|---|
| Pages (from-to) | 1323-1333 |
| Number of pages | 11 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 37 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - May 1990 |
| Externally published | Yes |