Alignment of ferroelectric liquid crystal on surface SiO2 films on oblique ion beam deposition

A. Murauski; Xihua Li; V. Chigrinov; A. Khokhlov; E. Khokhlov

Alignment of ferroelectric liquid crystal on surface SiO₂ films on oblique ion beam deposition

A. Murauski^*, Xihua Li, V. Chigrinov, A. Khokhlov, E. Khokhlov

^*Corresponding author for this work

Department of Electronic and Computer Engineering

Research output: Contribution to conference › Conference Paper › peer-review

Abstract

Investigation of alignment properties of SiO₂ thin films produced by oblique ion beam deposition on substrate surface is presented. Suitable uniform alignment properties of the ferroelectric liquid crystals can be received on the alignment layer prepared by this method. Large deposition angle from 80° to 70 ° can be used for thin SiO₂ layer deposition (from 10 to 20 nm). Linear design of the ion beam sputtering source gives a possibility to work with large size substrates.

Original language	English
Pages	75-77
Number of pages	3
Publication status	Published - 2006
Event	13th International Display Workshops, IDW '06 - Otsu, Japan Duration: 6 Dec 2006 → 6 Dec 2006

Conference

Conference	13th International Display Workshops, IDW '06
Country/Territory	Japan
City	Otsu
Period	6/12/06 → 6/12/06

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https://hdl.handle.net/1783.1/33519

Cite this

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title = "Alignment of ferroelectric liquid crystal on surface SiO2 films on oblique ion beam deposition",

abstract = "Investigation of alignment properties of SiO2 thin films produced by oblique ion beam deposition on substrate surface is presented. Suitable uniform alignment properties of the ferroelectric liquid crystals can be received on the alignment layer prepared by this method. Large deposition angle from 80° to 70 ° can be used for thin SiO2 layer deposition (from 10 to 20 nm). Linear design of the ion beam sputtering source gives a possibility to work with large size substrates.",

author = "A. Murauski and Xihua Li and V. Chigrinov and A. Khokhlov and E. Khokhlov",

year = "2006",

language = "English",

pages = "75--77",

note = "13th International Display Workshops, IDW '06 ; Conference date: 06-12-2006 Through 06-12-2006",

}

TY - CONF

T1 - Alignment of ferroelectric liquid crystal on surface SiO2 films on oblique ion beam deposition

AU - Murauski, A.

AU - Li, Xihua

AU - Chigrinov, V.

AU - Khokhlov, A.

AU - Khokhlov, E.

PY - 2006

Y1 - 2006

N2 - Investigation of alignment properties of SiO2 thin films produced by oblique ion beam deposition on substrate surface is presented. Suitable uniform alignment properties of the ferroelectric liquid crystals can be received on the alignment layer prepared by this method. Large deposition angle from 80° to 70 ° can be used for thin SiO2 layer deposition (from 10 to 20 nm). Linear design of the ion beam sputtering source gives a possibility to work with large size substrates.

AB - Investigation of alignment properties of SiO2 thin films produced by oblique ion beam deposition on substrate surface is presented. Suitable uniform alignment properties of the ferroelectric liquid crystals can be received on the alignment layer prepared by this method. Large deposition angle from 80° to 70 ° can be used for thin SiO2 layer deposition (from 10 to 20 nm). Linear design of the ion beam sputtering source gives a possibility to work with large size substrates.

UR - https://www.webofscience.com/wos/woscc/full-record/WOS:000258482700018

UR - https://www.scopus.com/pages/publications/57649149437

M3 - Conference Paper

SP - 75

EP - 77

T2 - 13th International Display Workshops, IDW '06

Y2 - 6 December 2006 through 6 December 2006

ER -

Alignment of ferroelectric liquid crystal on surface SiO₂ films on oblique ion beam deposition

Abstract

Conference

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