TY - JOUR
T1 - An explicit surface potential model of bulk-MOSFETs with inclusion of poly-gate accumulation, depletion, and inversion effects
AU - Shi, Min
AU - Song, Yan
AU - Zhang, Zhenjuan
AU - Sun, Ling
AU - Wang, Qiang
AU - He, Jin
AU - Chan, Mansun
PY - 2012
Y1 - 2012
N2 - An explicit surface potential model of the bulk-MOSFET with inclusion of the poly-gate accumulation, depletion, and inversion effects is derived from the basic MOS device physics and its solution result is also discussed in this paper. By the means of the appropriate approximations and device physics derivation, the complex group of the surface-potential and poly-silicon potential equations is transformed into one single explicit surface potential equation of a MOSFET with the poly-silicon accumulation/depletion/inversion effects. It is demonstrated that the proposed surface potential equation and its solution correctly yet accurately describe the physical behaviors of the poly-silicon potential, surface potential, gate charge, the gate capacitance, with continuous and smooth transitions from the accumulation region, thorough the depletion region, finally to the strong inversion region. The predicted MOSFET trans-capacitance behavior is verified by the result of fully numerical iteration method, thus, the surface potential equation presented can be used in advanced surface potential based MOSFET compact model development.
AB - An explicit surface potential model of the bulk-MOSFET with inclusion of the poly-gate accumulation, depletion, and inversion effects is derived from the basic MOS device physics and its solution result is also discussed in this paper. By the means of the appropriate approximations and device physics derivation, the complex group of the surface-potential and poly-silicon potential equations is transformed into one single explicit surface potential equation of a MOSFET with the poly-silicon accumulation/depletion/inversion effects. It is demonstrated that the proposed surface potential equation and its solution correctly yet accurately describe the physical behaviors of the poly-silicon potential, surface potential, gate charge, the gate capacitance, with continuous and smooth transitions from the accumulation region, thorough the depletion region, finally to the strong inversion region. The predicted MOSFET trans-capacitance behavior is verified by the result of fully numerical iteration method, thus, the surface potential equation presented can be used in advanced surface potential based MOSFET compact model development.
KW - Accumulation
KW - Compact model
KW - Depletion
KW - Inversion
KW - MOSFET
KW - Poly-silicon effects
KW - Surface potential
UR - https://www.webofscience.com/wos/woscc/full-record/WOS:000306862200012
UR - https://openalex.org/W2063660551
UR - https://www.scopus.com/pages/publications/84863004582
U2 - 10.1166/jctn.2012.2125
DO - 10.1166/jctn.2012.2125
M3 - Journal Article
SN - 1546-1955
VL - 9
SP - 963
EP - 968
JO - Journal of Computational and Theoretical Nanoscience
JF - Journal of Computational and Theoretical Nanoscience
IS - 7
ER -