Abstract
This work presents a new monomolecular photo-alignment layer material based on a cinnamate core and a phosphonic anchoring group that offers excellent photo-alignment properties and utilizes a dip-washing deposition process. The significant advantages of such materials include a room-temperature deposition process with no rubbing and baking procedures, which makes the alignment materials suitable for flexible substrates. Irradiation by linearly polarized light for a short time, 30-60 seconds, provides robust and stable planar/vertical alignment with good values of VHR andRDC. Such cinnamate derivatives with vertical and planar alignment capabilities open new opportunities to achieve a monomolecular alignment layer with an intermediate pretilt angle.
| Original language | English |
|---|---|
| Pages (from-to) | 1357-1360 |
| Number of pages | 4 |
| Journal | Digest of Technical Papers - SID International Symposium |
| Volume | 56 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 15 Aug 2025 |
| Event | International Symposium, Seminar, and Exhibition, Display Week 2025 - San Jose, United States Duration: 12 May 2025 → 16 May 2025 |
Bibliographical note
Publisher Copyright:© 2025, John Wiley and Sons Inc. All rights reserved.
Keywords
- Alignment
- phosphonic acid
- monomolecular layer
- cinnamate derivatives
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