Comparator With Non-Uniform Parameter Compensation Using Dual-Gate Thin-Film Transistors

Xuchi Liu, Runxiao Shi*, Wei Jiang, Xinying Xie, Man Wong*

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

Benefitting from the availability of a top gate serving as an “auxiliary” input terminal, a dual-gate (DG) thin-film transistor (TFT) can be incorporated in a circuit and used to mitigate potential performance degradation induced by the inevitable variation in TFT parameters. The utility of this scheme is demonstrated with the design, fabrication and characterization of a comparator. Compared to the traditional output storage compensation scheme deployed in state-of-the-art comparators based on conventional single-gate TFTs, the present scheme based on DG TFTs offers a reduction in amplifier stage count to 2 from 4 or 5, a reduced TFT count of 9, and a reduction in offset error from ∼0.4 V to 14 mV for comparators with D flip-flop while operating at a sampling rate of 2000 samples/s. The TFTs are fabricated using a 300-C metal-oxide TFT technology, potentially enabling their monolithic integration with bio-potential sensing circuits on a flexible substrate.

Original languageEnglish
Pages (from-to)597-600
Number of pages4
JournalIEEE Electron Device Letters
Volume45
Issue number4
DOIs
Publication statusPublished - 1 Apr 2024

Bibliographical note

Publisher Copyright:
© 2024 IEEE.

Keywords

  • Metal-oxide
  • comparator
  • compensation
  • non-uniformity
  • thin-film transistor

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