Abstract
Arsenic doped ZnO and ZnMgO films were deposited on SiO2 using radio frequency magnetron sputtering and ZnO-Zn3As2 and ZnO-Zn3As2 -MgO targets, respectively. It was found that thermal activation is required to activate the formation of p -type conductivity. Hall measurements showed that p -type films with a hole concentration of ∼ 1017 cm-3 and mobility of ∼8 cm2 V-1 s-1 were obtained at substrate temperatures of 400-500 °C. The shallow acceptor formation mechanism was investigated using x-ray photoelectron spectroscopy, positron annihilation, low temperature photoluminescence, and nuclear reaction analysis. The authors suggest that the thermal annealing activates the formation of the As Zn-2VZn shallow acceptor complex and removes the compensating hydrogen center.
| Original language | English |
|---|---|
| Article number | 03A103 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 29 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - May 2011 |
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SDG 7 Affordable and Clean Energy
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