Continuous electrodeposition onto a moving resistive cathode

L. Cai*, H. Y. Cheh

*Corresponding author for this work

Research output: Contribution to conferenceConference Paperpeer-review

Abstract

The primary, secondary and tertiary current distributions were calculated for a continuous moving flat electrode with high ohmic resistance. Effects of electrode resistance, electrolyte conductance, deposition kinetics and mass transfer on the uniformity of current distribution were discussed.

Original languageEnglish
Pages1051-1055
Number of pages5
Publication statusPublished - 1996
Externally publishedYes
EventProceedings of the 1996 83rd AESF Annual Technical Conference, SUR/FIN '96 - Cleveland, OH, USA
Duration: 10 Jun 199613 Jun 1996

Conference

ConferenceProceedings of the 1996 83rd AESF Annual Technical Conference, SUR/FIN '96
CityCleveland, OH, USA
Period10/06/9613/06/96

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