Corrugated Silicon Nitride Masks with Enhanced Mechanical Strength for Patterning RGB-Stripe OLED Microdisplays

Shou Cheng Dong, Jiye Yang, Bryan Siu Ting Tam, Ching W. Tang

Research output: Contribution to journalConference article published in journalpeer-review

1 Citation (Scopus)

Abstract

Corrugated silicon nitride masks (SiNMs) with improved mechanical strength are developed for patterning OLED microdisplays. The corrugations in the nitride membrane significantly increase the rigidity of the mask and reduce sagging, enabling 3000-ppi slot apertures for patterning RGB-stripe pixel layouts that are normally not achievable by fine metal masks.

Original languageEnglish
Pages (from-to)1784-1785
Number of pages2
JournalDigest of Technical Papers - SID International Symposium
Volume55
Issue number1
DOIs
Publication statusPublished - 2024
Externally publishedYes
EventInternational Symposium, Seminar, and Exhibition, Display Week 2024 - San Jose, United States
Duration: 12 May 202417 May 2024

Bibliographical note

Publisher Copyright:
© 2024, John Wiley and Sons Inc. All rights reserved.

Keywords

  • Corrugation
  • Direct patterning
  • OLED microdisplays
  • Shadow mask
  • Silicon nitride

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