Abstract
The performance of top-emitting organic light-emitting diodes depends not just on the choice of the transparent cathodes but also on their techniques of formation. Compared to the damage induced by radio frequency sputtering of indium-tin oxide cathode, that induced by dc sputtering was verified to be less severe and relatively independent of the sputtering power. Consequently a high dc sputtering power of 120 W could be employed to achieve a high deposition rate of 0.1 nm/s. Adequate emission efficiency was maintained, even with a relatively thin 7-nm copper (II) phthalocyanine buffer layer.
| Original language | English |
|---|---|
| Pages (from-to) | 315-317 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 24 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1 May 2003 |
Keywords
- Indium-tin oxide
- Organic light-emitting diodes
- Sputtering
- Top-emission
- Transparent cathode