DC sputtered indium-tin oxide transparent cathode for organic light-emitting diode

Haiying Chen*, Chengfeng Qiu, Man Wong, Hoi Sing Kwok

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

31 Citations (Scopus)

Abstract

The performance of top-emitting organic light-emitting diodes depends not just on the choice of the transparent cathodes but also on their techniques of formation. Compared to the damage induced by radio frequency sputtering of indium-tin oxide cathode, that induced by dc sputtering was verified to be less severe and relatively independent of the sputtering power. Consequently a high dc sputtering power of 120 W could be employed to achieve a high deposition rate of 0.1 nm/s. Adequate emission efficiency was maintained, even with a relatively thin 7-nm copper (II) phthalocyanine buffer layer.

Original languageEnglish
Pages (from-to)315-317
Number of pages3
JournalIEEE Electron Device Letters
Volume24
Issue number5
DOIs
Publication statusPublished - 1 May 2003

Keywords

  • Indium-tin oxide
  • Organic light-emitting diodes
  • Sputtering
  • Top-emission
  • Transparent cathode

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