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Degradation of Polycrystalline Silicon Thin-Film Transistors Under AC Gate Off-State Stress With a DC Drain Voltage Bias

  • Pengfei Liu
  • , Yunyang Wang
  • , Meng Zhang*
  • , Zhendong Jiang
  • , Lu Lei
  • , Lanrong Zou
  • , Man Wong
  • , Hoi Sing Kwok
  • *Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

The degradation behavior of polycrystalline silicon (poly-Si) thin-film transistors (TFTs) under alternating current (ac) off-state stress (OSS) with a direct current (dc) voltage bias is systematically investigated for the first time. Degradation is governed by the interplay between peak voltage duration, which controls trap emission and hot-carrier (HC) generation, and base voltage duration, which enables trap refilling. The applied dc drain bias further modifies the electric field in the p-n junction, with negative bias enhancing the field and accelerating HC degradation, while positive bias weakens the field and promotes carrier recapture. Supported by experiments and TCAD simulations, a unified emission-recapture model is proposed, offering clear guidance for improving device reliability in circuit applications.

Original languageEnglish
Article number11241148
Pages (from-to)5-12
Number of pages8
JournalIEEE Transactions on Electron Devices
Volume73
Issue number1
Early online date11 Nov 2025
DOIs
Publication statusPublished - Jan 2026

Bibliographical note

Publisher Copyright:
© 1963-2012 IEEE.

Keywords

  • Alternating current (ac) stress
  • emission time
  • hot carriers (HCs)
  • nonequilibrium p-n junction
  • polycrystalline silicon (poly-Si)
  • recapture time
  • thin-film transistors (TFTs)

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