Abstract
The degradation behavior of polycrystalline silicon (poly-Si) thin-film transistors (TFTs) under alternating current (ac) off-state stress (OSS) with a direct current (dc) voltage bias is systematically investigated for the first time. Degradation is governed by the interplay between peak voltage duration, which controls trap emission and hot-carrier (HC) generation, and base voltage duration, which enables trap refilling. The applied dc drain bias further modifies the electric field in the p-n junction, with negative bias enhancing the field and accelerating HC degradation, while positive bias weakens the field and promotes carrier recapture. Supported by experiments and TCAD simulations, a unified emission-recapture model is proposed, offering clear guidance for improving device reliability in circuit applications.
| Original language | English |
|---|---|
| Article number | 11241148 |
| Pages (from-to) | 5-12 |
| Number of pages | 8 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 73 |
| Issue number | 1 |
| Early online date | 11 Nov 2025 |
| DOIs | |
| Publication status | Published - Jan 2026 |
Bibliographical note
Publisher Copyright:© 1963-2012 IEEE.
Keywords
- Alternating current (ac) stress
- emission time
- hot carriers (HCs)
- nonequilibrium p-n junction
- polycrystalline silicon (poly-Si)
- recapture time
- thin-film transistors (TFTs)
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