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Design and Characterization of Sloped-Field-Plate Enhanced Trench Edge Termination

  • Wentao Yang
  • , Hao Feng
  • , Xiangming Fang
  • , Yong Liu
  • , Yuichi Onozawa
  • , Hiroyuki Tanaka
  • , Johnny K.O. Sin

Research output: Contribution to journalJournal Articlepeer-review

Abstract

In this paper, the design and characterization of the sloped-field-plate enhanced trench edge termination structure are carried out. For achieving the ideal planar junction breakdown voltage and high dV/dt performance, structural parameters, including the depth of the sloped-field-plate and the depth and width of the trench, need to be well designed. Using extensive numerical simulations, the above-mentioned design is accomplished. Experimental results show that for 600 V class devices, a breakdown voltage of 757 V can be achieved by the devices with a trench width larger than 20μm. The breakdown characteristics are verified as the ideal planar junction breakdown by using liquid crystal thermal measurement. Furthermore, the high dV/dt measurement results show that the devices with a trench width larger than 25μm are capable of handling a high dV/dt of 28.9 kV/μs even at a bus voltage of 750 V.

Original languageEnglish
Article number7790818
Pages (from-to)713-719
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume64
Issue number3
DOIs
Publication statusPublished - Mar 2017

Bibliographical note

Publisher Copyright:
© 2016 IEEE.

Keywords

  • Edge termination
  • high dV/dt performance
  • ideal planar junction breakdown
  • liquid crystal (LC) thermal measurement
  • sloped field plate (FP)
  • trench

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