Abstract
A methodology for simulating the device performance degradation considering the coupling effect of NBTI and SHE in SOI p-MOSFETs is proposed. NBTI models and thermal network are implanted into HiSIM with instantaneous parameter update during the transient simulation. The simulation results show that decoupling simulation will lead to non-ignorable inaccuracy.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the 2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2016 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 43-46 |
| Number of pages | 4 |
| ISBN (Electronic) | 9781467382588 |
| DOIs | |
| Publication status | Published - 9 Sept 2016 |
| Event | 23rd IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2016 - Singapore, Singapore Duration: 18 Jul 2016 → 21 Jul 2016 |
Publication series
| Name | Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA |
|---|---|
| Volume | 2016-September |
Conference
| Conference | 23rd IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2016 |
|---|---|
| Country/Territory | Singapore |
| City | Singapore |
| Period | 18/07/16 → 21/07/16 |
Bibliographical note
Publisher Copyright:© 2016 IEEE.
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