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Effect of grain boundary scattering on electron mobility of n-polarity InN films

Yuewei Zhang*, Xinqiang Wang, Xiantong Zheng, Guang Chen, Dingyu Ma, Fujun Xu, Ning Tang, Weikun Ge, Bo Shen

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

Transport properties of InN layers with both lattice polarities are reported. It is proposed that grain boundaries form potential barriers for electrons and thus lead to a reduction of electron mobility. However, these grain boundaries are important scattering centers only in the N-polarity InN films, but not in the In-polarity ones, which is consistent with the grain feature of the N-polarity InN surfaces. The carrier mobility in grain boundaries is estimated to be about 75 cm2 V-1 s-1 at room temperature for our sample, far less than the carrier mobility in the grains.

Original languageEnglish
Article number021001
JournalApplied Physics Express
Volume6
Issue number2
DOIs
Publication statusPublished - Feb 2013
Externally publishedYes

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