Effect of grain boundary scattering on electron mobility of n-polarity InN films

Yuewei Zhang*, Xinqiang Wang, Xiantong Zheng, Guang Chen, Dingyu Ma, Fujun Xu, Ning Tang, Weikun Ge, Bo Shen

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

13 Citations (Scopus)

Abstract

Transport properties of InN layers with both lattice polarities are reported. It is proposed that grain boundaries form potential barriers for electrons and thus lead to a reduction of electron mobility. However, these grain boundaries are important scattering centers only in the N-polarity InN films, but not in the In-polarity ones, which is consistent with the grain feature of the N-polarity InN surfaces. The carrier mobility in grain boundaries is estimated to be about 75 cm2 V-1 s-1 at room temperature for our sample, far less than the carrier mobility in the grains.

Original languageEnglish
Article number021001
JournalApplied Physics Express
Volume6
Issue number2
DOIs
Publication statusPublished - Feb 2013
Externally publishedYes

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