TY - JOUR
T1 - Electric field distribution around drain-side gate edge in algan/gan hemts
T2 - Analytical approach
AU - Si, Jia
AU - Wei, Jin
AU - Chen, Wanjun
AU - Zhang, Bo
PY - 2013
Y1 - 2013
N2 - An analytical model is proposed in this paper for the surface electric field around the drain-side gate edge in the AlGaN/GaN HEMT to which the gate leakage, current collapse, and so on are highly related. Conformal mapping is implemented to mirror the device structure into a simplified geometry and the solution to the Laplace equation is thus achieved. Obtained from the proposed model, the surface electric field in the AlGaN/GaN HEMT shows a high peak around the drain-side gate edge, which is the cause for many reliability issues in HEMTs. The proposed model is then used to study the main factors that may impact the field distribution, such as drain voltage, thickness of barrier, and so on. Numerical simulations are carried out and compared with the analytical model. The high agreement between the results verifies the proposed model.
AB - An analytical model is proposed in this paper for the surface electric field around the drain-side gate edge in the AlGaN/GaN HEMT to which the gate leakage, current collapse, and so on are highly related. Conformal mapping is implemented to mirror the device structure into a simplified geometry and the solution to the Laplace equation is thus achieved. Obtained from the proposed model, the surface electric field in the AlGaN/GaN HEMT shows a high peak around the drain-side gate edge, which is the cause for many reliability issues in HEMTs. The proposed model is then used to study the main factors that may impact the field distribution, such as drain voltage, thickness of barrier, and so on. Numerical simulations are carried out and compared with the analytical model. The high agreement between the results verifies the proposed model.
KW - Analytical model
KW - Gate-edge electric field
KW - Hemts
UR - https://www.webofscience.com/wos/woscc/full-record/WOS:000324928900034
UR - https://openalex.org/W2031318739
UR - https://www.scopus.com/pages/publications/84884817792
U2 - 10.1109/ted.2013.2272055
DO - 10.1109/ted.2013.2272055
M3 - Journal Article
SN - 0018-9383
VL - 60
SP - 3223
EP - 3229
JO - IEEE Transactions on Electron Devices
JF - IEEE Transactions on Electron Devices
IS - 10
M1 - 6564424
ER -