Evaluation of self-heating and hot carrier degradation of poly-Si thin-film transistors using charge pumping technique

Xiaowei Lu*, Mingxiang Wang, Kai Sun, Lei Lu

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

3 Citations (Scopus)

Abstract

Self-heating (SH) and hot carrier (HC) degradation of n-type poly-Si thin-film transistors (TFTs) is evaluated by using charge pumping (CP) technique. By extracting trap state energy distribution, it is demonstrated that SH degradation is mainly attributed to the generation of deep states. For HC stressed TFTs, an anomalous ICP decrease with the stress time is observed in a low Vg stress condition controlled by hole trapping; while in a mid Vg condition, CP signal clearly indicates the trap states generation controlled by electron trapping.

Original languageEnglish
Title of host publication2010 IEEE International Reliability Physics Symposium, IRPS 2010
Pages1040-1043
Number of pages4
DOIs
Publication statusPublished - 2010
Externally publishedYes
Event2010 IEEE International Reliability Physics Symposium, IRPS 2010 - Garden Grove, CA, Canada
Duration: 2 May 20106 May 2010

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
ISSN (Print)1541-7026

Conference

Conference2010 IEEE International Reliability Physics Symposium, IRPS 2010
Country/TerritoryCanada
CityGarden Grove, CA
Period2/05/106/05/10

Keywords

  • Charge pumping
  • Hot carrier
  • Poly-Si TFTs
  • Self-heating

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