Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Zhiyong Xiao; Chunhua Feng; Philip C.H. Chan; I. Ming Hsing

doi:10.1109/SENSOR.2007.4300078

Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Zhiyong Xiao^*, Chunhua Feng, Philip C.H. Chan, I. Ming Hsing

^*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/Report › Conference Paper published in a book › peer-review

2 Citations (Scopus)

Abstract

This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.

Original language	English
Title of host publication	TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems
Pages	89-92
Number of pages	4
DOIs	https://doi.org/10.1109/SENSOR.2007.4300078
Publication status	Published - 2007
Event	4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 - Lyon, France Duration: 10 Jun 2007 → 14 Jun 2007

Publication series

Name	TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

Conference

Conference	4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07
Country/Territory	France
City	Lyon
Period	10/06/07 → 14/06/07

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy
SDG 9 Industry, Innovation, and Infrastructure

Keywords

Makless DRIE porous polysilicon nano

Access to Document

10.1109/SENSOR.2007.4300078

Cite this

Xiao, Z., Feng, C., Chan, P. C. H., & Hsing, I. M. (2007). Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. In TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems (pp. 89-92). Article 4300078 (TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems). https://doi.org/10.1109/SENSOR.2007.4300078

Xiao, Zhiyong ; Feng, Chunhua ; Chan, Philip C.H. et al. / Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems. 2007. pp. 89-92 (TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems).

@inproceedings{f1ea05918f414a40b664d2ccb537d185,

title = "Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process",

abstract = "This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.",

keywords = "Makless DRIE porous polysilicon nano",

author = "Zhiyong Xiao and Chunhua Feng and Chan, \{Philip C.H.\} and Hsing, \{I. Ming\}",

year = "2007",

doi = "10.1109/SENSOR.2007.4300078",

language = "English",

isbn = "1424408423",

series = "TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems",

pages = "89--92",

booktitle = "TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems",

note = "4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 ; Conference date: 10-06-2007 Through 14-06-2007",

}

Xiao, Z, Feng, C, Chan, PCH & Hsing, IM 2007, Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. in TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems., 4300078, TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems, pp. 89-92, 4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07, Lyon, France, 10/06/07. https://doi.org/10.1109/SENSOR.2007.4300078

Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. / Xiao, Zhiyong; Feng, Chunhua; Chan, Philip C.H. et al.
TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems. 2007. p. 89-92 4300078 (TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems).

Research output: Chapter in Book/Conference Proceeding/Report › Conference Paper published in a book › peer-review

TY - GEN

T1 - Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

AU - Xiao, Zhiyong

AU - Feng, Chunhua

AU - Chan, Philip C.H.

AU - Hsing, I. Ming

PY - 2007

Y1 - 2007

N2 - This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.

AB - This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.

KW - Makless DRIE porous polysilicon nano

UR - https://openalex.org/W2022437294

UR - https://www.scopus.com/pages/publications/50049105789

U2 - 10.1109/SENSOR.2007.4300078

DO - 10.1109/SENSOR.2007.4300078

M3 - Conference Paper published in a book

SN - 1424408423

SN - 9781424408429

T3 - TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

SP - 89

EP - 92

BT - TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

T2 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07

Y2 - 10 June 2007 through 14 June 2007

ER -

Xiao Z, Feng C, Chan PCH, Hsing IM. Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. In TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems. 2007. p. 89-92. 4300078. (TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems). doi: 10.1109/SENSOR.2007.4300078

Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Abstract

Publication series

Conference

UN SDGs

Keywords

Access to Document

Other files and links

Fingerprint

Cite this