Full-composition-graded InxGa1-xN films grown by molecular beam epitaxy

X. T. Zheng, T. Wang, P. Wang, X. X. Sun, D. Wang, Z. Y. Chen, P. Quach, Y. X. Wang, X. L. Yang, F. J. Xu, Z. X. Qin, T. J. Yu, W. K. Ge, B. Shen, X. Q. Wang*

*Corresponding author for this work

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9 Citations (Scopus)

Abstract

We demonstrate the growth of full-composition-graded InxGa1-xN (0 ≤ x ≤ 1) on a GaN/sapphire template using plasma-assisted molecular beam epitaxy. Composition of indium in InxGa1-xN films is controlled by growth temperature and gallium flux. It was found that In composition increases gradually from x = 0 (GaN) to x = 1 (InN) along the growth direction accompanied by a gradual strain relaxation. At the initial stage of growth, multiple quantum wells like structures with low and high In composition InxGa1-xN layers are spontaneously formed, effectively relaxing the in-plane strain. Finally, the graded InxGa1-xN film exhibits a broadband absorption covering the full solar spectrum, which provides a promising path for the design and production of graded InxGa1-xN based photovoltaic devices.

Original languageEnglish
Article number182101
JournalApplied Physics Letters
Volume117
Issue number18
DOIs
Publication statusPublished - 2 Nov 2020
Externally publishedYes

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