Abstract
We demonstrate the growth of full-composition-graded InxGa1-xN (0 ≤ x ≤ 1) on a GaN/sapphire template using plasma-assisted molecular beam epitaxy. Composition of indium in InxGa1-xN films is controlled by growth temperature and gallium flux. It was found that In composition increases gradually from x = 0 (GaN) to x = 1 (InN) along the growth direction accompanied by a gradual strain relaxation. At the initial stage of growth, multiple quantum wells like structures with low and high In composition InxGa1-xN layers are spontaneously formed, effectively relaxing the in-plane strain. Finally, the graded InxGa1-xN film exhibits a broadband absorption covering the full solar spectrum, which provides a promising path for the design and production of graded InxGa1-xN based photovoltaic devices.
| Original language | English |
|---|---|
| Article number | 182101 |
| Journal | Applied Physics Letters |
| Volume | 117 |
| Issue number | 18 |
| DOIs | |
| Publication status | Published - 2 Nov 2020 |
| Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2020 Author(s).