Skip to main navigation Skip to search Skip to main content

Full-composition-graded InxGa1-xN films grown by molecular beam epitaxy

  • X. T. Zheng
  • , T. Wang
  • , P. Wang
  • , X. X. Sun
  • , D. Wang
  • , Z. Y. Chen
  • , P. Quach
  • , Y. X. Wang
  • , X. L. Yang
  • , F. J. Xu
  • , Z. X. Qin
  • , T. J. Yu
  • , W. K. Ge
  • , B. Shen
  • , X. Q. Wang*
  • *Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

Abstract

We demonstrate the growth of full-composition-graded InxGa1-xN (0 ≤ x ≤ 1) on a GaN/sapphire template using plasma-assisted molecular beam epitaxy. Composition of indium in InxGa1-xN films is controlled by growth temperature and gallium flux. It was found that In composition increases gradually from x = 0 (GaN) to x = 1 (InN) along the growth direction accompanied by a gradual strain relaxation. At the initial stage of growth, multiple quantum wells like structures with low and high In composition InxGa1-xN layers are spontaneously formed, effectively relaxing the in-plane strain. Finally, the graded InxGa1-xN film exhibits a broadband absorption covering the full solar spectrum, which provides a promising path for the design and production of graded InxGa1-xN based photovoltaic devices.

Original languageEnglish
Article number182101
JournalApplied Physics Letters
Volume117
Issue number18
DOIs
Publication statusPublished - 2 Nov 2020
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2020 Author(s).

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Fingerprint

Dive into the research topics of 'Full-composition-graded InxGa1-xN films grown by molecular beam epitaxy'. Together they form a unique fingerprint.

Cite this