Abstract
A 2-inch wafer-scale electron-beam (e-beam) pumped deep-ultraviolet surface emitter (DUVSE) with high efficiency and high output power at an emission wavelength of 248 nm is reported. This DUVSE benefits from ultra-thin staggered AlN/AlGaN/GaN multiple quantum wells (MQWs), which compromise the electron–hole overlap and carrier confinement and thus significantly improve the emission efficiency. The wall-plug-efficiency (WPE) is increased by six times to 5.25% in comparison to that of conventional DUV light-emitting devices (LEDs) based on AlGaN MQWs. This WPE is achieved under an anode voltage and current of 8 kV and 1 mA, where the output power is 420 mW. This output power can be further enhanced to 702 mW by increasing the anode current to 3 mA. The enhanced WPE and uniform electron beam distribution lighten the avenue to achieve a wafer-scale high power dense DUV light source, which is a challenge for conventional DUV-LEDs, in particular with an emission wavelength of less than 250 nm.
| Original language | English |
|---|---|
| Article number | 2200011 |
| Journal | Advanced Optical Materials |
| Volume | 10 |
| Issue number | 18 |
| DOIs | |
| Publication status | Published - 19 Sept 2022 |
| Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2022 Wiley-VCH GmbH.
Keywords
- deep ultraviolet
- high output power
- metal-organic chemical vapor deposition
- ultra-thin multiple quantum wells