Abstract
The hydrogen passivation is adopted to enhance the performance of poly-Si crystallized by YAG laser annealing (LA poly-Si). The effects of passivation time, passivation power and passivation temperature on the hall mobility of the LA poly-Si are investigated and the mechanism of the hydrogen passivation is preliminarily analyzed. It is found that the effect of the hydrogen passivation on the qulity of YAG laser annealed poly-Si is also correlated with the deposition method and the defect type in it.
| Original language | English |
|---|---|
| Pages (from-to) | 288-290 |
| Number of pages | 3 |
| Journal | Optoelectronics Letters |
| Volume | 6 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2010 |
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