Impact of transistor-to-grain size statistics on large-grain polysilicon TFT characteristics

C. F. Cheng*, M. C. Poon, C. W. Kok, Mansun Chan

*Corresponding author for this work

Research output: Contribution to journalConference article published in journalpeer-review

2 Citations (Scopus)

Abstract

A model based on grain-boundary distribution to predict the impact of transistor-to-grain size statistics on transistor performance variation is proposed and extensively verified by experimental data. Using the model, optimization of transistor dimension with respect to grain size to achieve high mobility and low transistor-to-transistor variation to enhance the yield can be performed.

Original languageEnglish
Pages (from-to)789-790
Number of pages2
JournalTechnical Digest - International Electron Devices Meeting, IEDM
Publication statusPublished - 2004
EventIEEE International Electron Devices Meeting, 2004 IEDM - San Francisco, CA, United States
Duration: 13 Dec 200415 Dec 2004

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