Abstract
A model based on grain-boundary distribution to predict the impact of transistor-to-grain size statistics on transistor performance variation is proposed and extensively verified by experimental data. Using the model, optimization of transistor dimension with respect to grain size to achieve high mobility and low transistor-to-transistor variation to enhance the yield can be performed.
| Original language | English |
|---|---|
| Pages (from-to) | 789-790 |
| Number of pages | 2 |
| Journal | Technical Digest - International Electron Devices Meeting, IEDM |
| Publication status | Published - 2004 |
| Event | IEEE International Electron Devices Meeting, 2004 IEDM - San Francisco, CA, United States Duration: 13 Dec 2004 → 15 Dec 2004 |
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