Indium-gallium-zinc oxide thin-film transistors for high-resolution active-matrix ferroelectric liquid-crystal displays

Sisi Wang, Zhibo Sun, Zhihe Xia, Zhengnan Yuan, Lei Lu, Abhishek Kumar Srivastava, Hoi Sing Kwok, Man Wong

Research output: Contribution to journalConference article published in journalpeer-review

Abstract

Realization of a near-eye, liquid-crystal (LC) display with resolution density > 2000 pixels per inch (PPI) is desired but places great demands on the choices of the LC and the thin-film transistor (TFT) backplane technology. Presently investigated is the requirement placed on the allowable leakage current in the off-state of a scan transistor in an active-matrix LC display. With the resolution boosted by the elimination of the storage capacitor, an even more stringent limit is placed on the leakage current. It is concluded that a backplane technology based on metal-oxide TFTs offering inherently low leakage current enables the construction of a higher-resolution display. As a demonstration, a 500 PPI display based on deformed-helix ferroelectric LC and indium-gallium-zinc oxide TFTs has been fabricated and characterized.

Original languageEnglish
Pages (from-to)1114-1117
Number of pages4
JournalDigest of Technical Papers - SID International Symposium
Volume53
Issue number1
DOIs
Publication statusPublished - 2022
Event59th International Symposium, Seminar and Exhibition, Display Week 2022 - San Jose, United States
Duration: 8 May 202213 May 2022

Bibliographical note

Publisher Copyright:
© 2022. John Wiley and Sons Inc. AIAA. All rights reserved.

Keywords

  • Active-matrix
  • Ferroelectric liquid crystal
  • High resolution
  • Liquid crystal display
  • Metal-oxide semiconductor
  • Thin-film transistor

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