Abstract
We demonstrate that different doping approaches can significantly influence the lattice locations of carbon (C) in GaN grown by MOCVD. For intrinsically doped GaN with TMGa as the C source, an annealing induced switching process of C atoms from Ga sites to N sites is observed, revealing the existence of substitutional C atoms on both Ga and N sites. While for extrinsically doped GaN with propane as the C precursor, C atoms incorporate almost on N sites. From the viewpoint of growth dynamics, we propose a mechanism for C incorporation into different lattice locations.
| Original language | English |
|---|---|
| Article number | 061002 |
| Journal | Applied Physics Express |
| Volume | 12 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Jun 2019 |
| Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2019 The Japan Society of Applied Physics.