Latest progress in gallium-oxide electronic devices

Masataka Higashiwaki*, Man Hoi Wong, Keita Konishi, Yoshiaki Nakata, Chia Hung Lin, Takafumi Kamimura, Lingaparthi Ravikiran, Kohei Sasaki, Ken Goto, Akinori Takeyama, Takahiro Makino, Takeshi Ohshima, Akito Kuramata, Shigenobu Yamakoshi, Hisashi Murakami, Yoshinao Kumagai

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

Abstract

Gallium oxide (Ga2O3) has emerged as a new competitor to SiC and GaN in the race toward next-generation power switching and harsh environment electronics by virtue of the excellent material properties and the relative ease of mass wafer production. In this proceedings paper, an overview of our recent development progress of Ga2O3 metal-oxide-semiconductor field-effect transistors and Schottky barrier diodes will be reported.

Original languageEnglish
Title of host publicationOxide-Based Materials and Devices IX
EditorsDavid J. Rogers, Ferechteh H. Teherani, David C. Look
PublisherSPIE
ISBN (Electronic)9781510615519
DOIs
Publication statusPublished - 2018
Externally publishedYes
EventOxide-Based Materials and Devices IX 2018 - San Francisco, United States
Duration: 28 Jan 20181 Feb 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10533
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOxide-Based Materials and Devices IX 2018
Country/TerritoryUnited States
CitySan Francisco
Period28/01/181/02/18

Bibliographical note

Publisher Copyright:
© Copyright 2018 SPIE.

Keywords

  • Gallium oxide (GaO)
  • Schottky barrier diode (SBD)
  • harsh environment electronics
  • metal-oxide-semiconductor field-effect transistor (MOSFET)
  • power electronics

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