Abstract
Gallium oxide (Ga2O3) has emerged as a new competitor to SiC and GaN in the race toward next-generation power switching and harsh environment electronics by virtue of the excellent material properties and the relative ease of mass wafer production. In this proceedings paper, an overview of our recent development progress of Ga2O3 metal-oxide-semiconductor field-effect transistors and Schottky barrier diodes will be reported.
| Original language | English |
|---|---|
| Title of host publication | Oxide-Based Materials and Devices IX |
| Editors | David J. Rogers, Ferechteh H. Teherani, David C. Look |
| Publisher | SPIE |
| ISBN (Electronic) | 9781510615519 |
| DOIs | |
| Publication status | Published - 2018 |
| Externally published | Yes |
| Event | Oxide-Based Materials and Devices IX 2018 - San Francisco, United States Duration: 28 Jan 2018 → 1 Feb 2018 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 10533 |
| ISSN (Print) | 0277-786X |
| ISSN (Electronic) | 1996-756X |
Conference
| Conference | Oxide-Based Materials and Devices IX 2018 |
|---|---|
| Country/Territory | United States |
| City | San Francisco |
| Period | 28/01/18 → 1/02/18 |
Bibliographical note
Publisher Copyright:© Copyright 2018 SPIE.
Keywords
- Gallium oxide (GaO)
- Schottky barrier diode (SBD)
- harsh environment electronics
- metal-oxide-semiconductor field-effect transistor (MOSFET)
- power electronics