Latest progress in gallium oxide epitaxial growth technologies for power devices

K. Goto; M. Higashiwaki; T. Kamimura; K. Konishi; Y. Kumagai; A. Kuramata; H. Murakami; Y. Nakata; K. Sasaki; Man Hoi Wong; S. Yamakoshi

Latest progress in gallium oxide epitaxial growth technologies for power devices

K. Goto, M. Higashiwaki, T. Kamimura, K. Konishi, Y. Kumagai, A. Kuramata, H. Murakami, Y. Nakata, K. Sasaki, Man Hoi Wong, S. Yamakoshi

The Hong Kong University of Science and Technology

Research output: Contribution to conference › Conference Paper

Original language	English
Publication status	Published - 2017
Event	21st American Conference on Crystal Growth and Epitaxy (ACCGE-21)/18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18) - Duration: 1 Jan 2017 → 1 Jan 2017

Conference

Conference	21st American Conference on Crystal Growth and Epitaxy (ACCGE-21)/18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18)
Period	1/01/17 → 1/01/17

Access to Document

https://hdl.handle.net/1783.1/120915

Cite this

Goto, K., Higashiwaki, M., Kamimura, T., Konishi, K., Kumagai, Y., Kuramata, A., Murakami, H., Nakata, Y., Sasaki, K., Wong, M. H., & Yamakoshi, S. (2017). Latest progress in gallium oxide epitaxial growth technologies for power devices. Paper presented at 21st American Conference on Crystal Growth and Epitaxy (ACCGE-21)/18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18). https://hdl.handle.net/1783.1/120915

@conference{c5a0d18fc3cd44fe9ae24d266c88328e,

title = "Latest progress in gallium oxide epitaxial growth technologies for power devices",

author = "K. Goto and M. Higashiwaki and T. Kamimura and K. Konishi and Y. Kumagai and A. Kuramata and H. Murakami and Y. Nakata and K. Sasaki and Wong, \{Man Hoi\} and S. Yamakoshi",

year = "2017",

language = "English",

note = "21st American Conference on Crystal Growth and Epitaxy (ACCGE-21)/18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18) ; Conference date: 01-01-2017 Through 01-01-2017",

}

Goto, K, Higashiwaki, M, Kamimura, T, Konishi, K, Kumagai, Y, Kuramata, A, Murakami, H, Nakata, Y, Sasaki, K, Wong, MH & Yamakoshi, S 2017, 'Latest progress in gallium oxide epitaxial growth technologies for power devices', Paper presented at 21st American Conference on Crystal Growth and Epitaxy (ACCGE-21)/18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18), 1/01/17 - 1/01/17. <https://hdl.handle.net/1783.1/120915>

TY - CONF

T1 - Latest progress in gallium oxide epitaxial growth technologies for power devices

AU - Goto, K.

AU - Higashiwaki, M.

AU - Kamimura, T.

AU - Konishi, K.

AU - Kumagai, Y.

AU - Kuramata, A.

AU - Murakami, H.

AU - Nakata, Y.

AU - Sasaki, K.

AU - Wong, Man Hoi

AU - Yamakoshi, S.

PY - 2017

Y1 - 2017

M3 - Conference Paper

T2 - 21st American Conference on Crystal Growth and Epitaxy (ACCGE-21)/18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18)

Y2 - 1 January 2017 through 1 January 2017

ER -