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Macromol. Rapid Commun. 7/2010

  • Lutao Weng
  • , Volker Altstädt
  • , Manuel Kempf
  • , Jerold M. Schultz
  • , Chi Ming Chan*
  • , Richard Yiu Ting Lau
  • , Kai Mo Ng
  • *Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

Back Cover: The schematic image presents an oligomer that contains an active dipole group and can be aligned by a low-energy electron beam. This novel finding offers a facile method to control molecular ordering and allows versatile patterning of ordered and disordered regions as imprinted by a mask. Further details can be found in the article by Y. T. R. Lau, L. T. Weng, K. M. Ng, M. Kempf, V. Altstadt, J. M. Schultz, C.-M. Chan* on page 634.
Original languageEnglish
JournalMacromolecular Rapid Communications
Volumev. 31
DOIs
Publication statusPublished - Apr 2010

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