Abstract
Back Cover: The schematic image presents an oligomer that contains an active dipole group and can be aligned by a low-energy electron beam. This novel finding offers a facile method to control molecular ordering and allows versatile patterning of ordered and disordered regions as imprinted by a mask. Further details can be found in the article by Y. T. R. Lau, L. T. Weng, K. M. Ng, M. Kempf, V. Altstadt, J. M. Schultz, C.-M. Chan* on page 634.
| Original language | English |
|---|---|
| Journal | Macromolecular Rapid Communications |
| Volume | v. 31 |
| DOIs | |
| Publication status | Published - Apr 2010 |
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