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MBE grown monocrystalline GaAs films on polycrystalline AlN thick films for power device applications

  • Y. Wang*
  • , Leung Yee Wai
  • , Hui Liu
  • , Xixiang Zhang
  • , Yuchun Chang
  • , Hailin Luo
  • , Liren Lou
  • , Rong Chuan Fang
  • *Corresponding author for this work

Research output: Contribution to journalConference article published in journalpeer-review

Abstract

A device-quality GaAs monocrystalline films were fabricated on AlN polycrystalline films. The X-ray characterization reveals that the (001) preferential orientated AlN thick films with very low stress can be grown by DC reactive sputtering. The photothermal deflection spectroscopic measurements of the GaAs-on-AlN composite material show that a reasonably high thermal conductivity can be obtained. Hall measurements and I-V characteristics of Schottky diodes show that the epi-GaAs films on AlN thick films have similar electric properties of bulk materials.

Original languageEnglish
Pages (from-to)177-182
Number of pages6
JournalJournal of Crystal Growth
Volume227-228
DOIs
Publication statusPublished - Jul 2001
Externally publishedYes
Event11th International Conference on Molecular Beam Epitaxy - Bijing, China
Duration: 11 Sept 200015 Sept 2000

Keywords

  • A3. Polycrystalline deposition
  • B1. Nitrides
  • B2. Semiconducting gallium arsenide

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