Measurement of heat capacity of SnO2 thin films using micro-hotplate

Jun Yu; Zhenana Tang; Guangfena Wei; Philip C.H. Chan

doi:10.1117/12.444709

Measurement of heat capacity of SnO₂ thin films using micro-hotplate

Jun Yu^*, Zhenana Tang, Guangfena Wei, Philip C.H. Chan

^*Corresponding author for this work

Research output: Contribution to journal › Conference article published in journal › peer-review

2 Citations (Scopus)

Abstract

Thermophysical properties of thin films in microscale are much more different from that of bulk materials. It is very important to characterize their properties for the design and analysis of MEMS devices and ICs. In this paper we demonstrate a technique to test heat capacity of SnO₂ thin film. For this purpose, micro-hotplate (MHP) is used as a thin-film differential scanning calorimeter (TDSC). Micro-hotplate is a suspended structure that uses SiO₂/Si₃N₄ membrane as mechanical support and polysilicon resistors as heater and temperature sensor. Providing a pulsed power to the heater, MHP will be heated up with heating rate of about 200000 °C/s, and with TDSC technique, heat capacity of SnO₂ thin film with thickness of 300 nm is measured at temperature ranging from room temperature to 400 K.

Original language	English
Pages (from-to)	234-237
Number of pages	4
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4601
DOIs	https://doi.org/10.1117/12.444709
Publication status	Published - 2001
Externally published	Yes
Event	Micromachining and Microfabrication Process Technology and Devices - Nanjing, China Duration: 7 Nov 2001 → 9 Nov 2001

Keywords

Heat capacity
Micro-hotplate (MHP)
Thin-film differential scanning calorimeter (TDSC)

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10.1117/12.444709

Cite this

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title = "Measurement of heat capacity of SnO2 thin films using micro-hotplate",

abstract = "Thermophysical properties of thin films in microscale are much more different from that of bulk materials. It is very important to characterize their properties for the design and analysis of MEMS devices and ICs. In this paper we demonstrate a technique to test heat capacity of SnO2 thin film. For this purpose, micro-hotplate (MHP) is used as a thin-film differential scanning calorimeter (TDSC). Micro-hotplate is a suspended structure that uses SiO2/Si3N4 membrane as mechanical support and polysilicon resistors as heater and temperature sensor. Providing a pulsed power to the heater, MHP will be heated up with heating rate of about 200000 °C/s, and with TDSC technique, heat capacity of SnO2 thin film with thickness of 300 nm is measured at temperature ranging from room temperature to 400 K.",

keywords = "Heat capacity, Micro-hotplate (MHP), Thin-film differential scanning calorimeter (TDSC)",

author = "Jun Yu and Zhenana Tang and Guangfena Wei and Chan, \{Philip C.H.\}",

year = "2001",

doi = "10.1117/12.444709",

language = "English",

volume = "4601",

pages = "234--237",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Micromachining and Microfabrication Process Technology and Devices ; Conference date: 07-11-2001 Through 09-11-2001",

}

TY - JOUR

T1 - Measurement of heat capacity of SnO2 thin films using micro-hotplate

AU - Yu, Jun

AU - Tang, Zhenana

AU - Wei, Guangfena

AU - Chan, Philip C.H.

PY - 2001

Y1 - 2001

N2 - Thermophysical properties of thin films in microscale are much more different from that of bulk materials. It is very important to characterize their properties for the design and analysis of MEMS devices and ICs. In this paper we demonstrate a technique to test heat capacity of SnO2 thin film. For this purpose, micro-hotplate (MHP) is used as a thin-film differential scanning calorimeter (TDSC). Micro-hotplate is a suspended structure that uses SiO2/Si3N4 membrane as mechanical support and polysilicon resistors as heater and temperature sensor. Providing a pulsed power to the heater, MHP will be heated up with heating rate of about 200000 °C/s, and with TDSC technique, heat capacity of SnO2 thin film with thickness of 300 nm is measured at temperature ranging from room temperature to 400 K.

AB - Thermophysical properties of thin films in microscale are much more different from that of bulk materials. It is very important to characterize their properties for the design and analysis of MEMS devices and ICs. In this paper we demonstrate a technique to test heat capacity of SnO2 thin film. For this purpose, micro-hotplate (MHP) is used as a thin-film differential scanning calorimeter (TDSC). Micro-hotplate is a suspended structure that uses SiO2/Si3N4 membrane as mechanical support and polysilicon resistors as heater and temperature sensor. Providing a pulsed power to the heater, MHP will be heated up with heating rate of about 200000 °C/s, and with TDSC technique, heat capacity of SnO2 thin film with thickness of 300 nm is measured at temperature ranging from room temperature to 400 K.

KW - Heat capacity

KW - Micro-hotplate (MHP)

KW - Thin-film differential scanning calorimeter (TDSC)

UR - https://www.webofscience.com/wos/woscc/full-record/WOS:000176126700040

UR - https://www.scopus.com/pages/publications/0035773547

U2 - 10.1117/12.444709

DO - 10.1117/12.444709

M3 - Conference article published in journal

AN - SCOPUS:0035773547

SN - 0277-786X

VL - 4601

SP - 234

EP - 237

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Micromachining and Microfabrication Process Technology and Devices

Y2 - 7 November 2001 through 9 November 2001

ER -

Measurement of heat capacity of SnO₂ thin films using micro-hotplate

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Keywords

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