Microbridge testing on symmetrical trilayer films

In this paper, we extended the microbridge testing method to characterize the mechanical properties of symmetrical trilayer thin films. Theoretically, we analyzed the deformation of a trilayer microbridge sample with a deformable boundary condition and derived load-deflection formulas in closed-form. The slope of a load-deflection curve under small deformation gives the relationship between the bending stiffness and the residual force of a trilayer microbridge. Taking this relationship, we were able to assess simultaneously the Young's modulus of two kinds of materials composing the symmetrical trilayer film and the thickness-averaged residual stress of the film. Experimentally, we fabricated symmetrical trilayer microbridge samples of SiO₂/Si₃N₄/SiO₂ on 4-inch p-type (100) silicon wafers and conducted the microbridge tests with a load and displacement sensing nanoindenter system equipped with a microwedge indenter. The experimental results verified the proposed microbridge testing method. The thickness-averaged residual stress of the 1.1-μm trilayer thin films was determined to be 8.8 MPa, while the Young's modulus of the 0.3-μm silicon oxide layers and the Young's modulus of the 0.5-μm silicon nitride layer were evaluated to be 31 GPa and 294 GPa, respectively.