Model for field emission from p-type silicon

Qing An Huang*, Ming Qin, Bin Zhang, Johnny K.O. Sin

*Corresponding author for this work

Research output: Contribution to conferenceConference Paperpeer-review

Abstract

Field emission from p-type silicon is very sensitive to external excitation by light or heat, which leads to use of p-type silicon emitter in photocathodes. When an external field is applied to the p-type silicon emitter, field penetration into p-type silicon emitter creates a depletion region and causes the field emission current to be limited by the supply of electrons in the presence of a high electric field. A model is presented that takes field-enhanced generation within the depletion region into account, which may explain the nonlinear phenomenon in Fowler-Nordheim plots of p-type silicon.

Original languageEnglish
Pages291-295
Number of pages5
Publication statusPublished - 1997
Externally publishedYes
EventProceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97 - Kyongju, Korea
Duration: 17 Aug 199721 Aug 1997

Conference

ConferenceProceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97
CityKyongju, Korea
Period17/08/9721/08/97

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