Novel photosensitive polyimidesiloxanes

J. O. Choi; J. C. Rosenfeld; J. H. Yang; S. R. Rojstaczer; S. Jeng; M. Xu; H. S. Kwok

Novel photosensitive polyimidesiloxanes

J. O. Choi^*, J. C. Rosenfeld, J. H. Yang, S. R. Rojstaczer, S. Jeng, M. Xu, H. S. Kwok

^*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/Report › Conference Paper published in a book › peer-review

Abstract

Photosensitive polyimidesiloxanes have been synthesized. The incorporation of unsaturated groups was confirmed spectroscopically. Well resolved patterns have been generated with these polyimidesiloxanes and organic developers. The photosensitive polyimidesiloxane has lower modulus than the corresponding photosensitive polyimide. This result causes less stress in microelectronic applications. Incorporation of the siloxane moiety also lowers the moisture absorption.

Original language	English
Title of host publication	Electronic Materials
Subtitle of host publication	Technology, Here and Now
Publisher	Publ by SAMPE
Pages	359-364
Number of pages	6
ISBN (Print)	0938994581
Publication status	Published - 1991
Externally published	Yes
Event	5th Annual International Sampe Electronics Conference - Los Angeles, CA, USA Duration: 18 Jun 1991 → 20 Jun 1991

Publication series

Name	Electronic Materials: Technology, Here and Now

Conference

Conference	5th Annual International Sampe Electronics Conference
City	Los Angeles, CA, USA
Period	18/06/91 → 20/06/91

Cite this

@inproceedings{b28fbdbb995845518d7a7bfd6afe31c2,

title = "Novel photosensitive polyimidesiloxanes",

abstract = "Photosensitive polyimidesiloxanes have been synthesized. The incorporation of unsaturated groups was confirmed spectroscopically. Well resolved patterns have been generated with these polyimidesiloxanes and organic developers. The photosensitive polyimidesiloxane has lower modulus than the corresponding photosensitive polyimide. This result causes less stress in microelectronic applications. Incorporation of the siloxane moiety also lowers the moisture absorption.",

author = "Choi, \{J. O.\} and Rosenfeld, \{J. C.\} and Yang, \{J. H.\} and Rojstaczer, \{S. R.\} and S. Jeng and M. Xu and Kwok, \{H. S.\}",

year = "1991",

language = "English",

isbn = "0938994581",

series = "Electronic Materials: Technology, Here and Now",

publisher = "Publ by SAMPE",

pages = "359--364",

booktitle = "Electronic Materials",

note = "5th Annual International Sampe Electronics Conference ; Conference date: 18-06-1991 Through 20-06-1991",

}

TY - GEN

T1 - Novel photosensitive polyimidesiloxanes

AU - Choi, J. O.

AU - Rosenfeld, J. C.

AU - Yang, J. H.

AU - Rojstaczer, S. R.

AU - Jeng, S.

AU - Xu, M.

AU - Kwok, H. S.

PY - 1991

Y1 - 1991

N2 - Photosensitive polyimidesiloxanes have been synthesized. The incorporation of unsaturated groups was confirmed spectroscopically. Well resolved patterns have been generated with these polyimidesiloxanes and organic developers. The photosensitive polyimidesiloxane has lower modulus than the corresponding photosensitive polyimide. This result causes less stress in microelectronic applications. Incorporation of the siloxane moiety also lowers the moisture absorption.

AB - Photosensitive polyimidesiloxanes have been synthesized. The incorporation of unsaturated groups was confirmed spectroscopically. Well resolved patterns have been generated with these polyimidesiloxanes and organic developers. The photosensitive polyimidesiloxane has lower modulus than the corresponding photosensitive polyimide. This result causes less stress in microelectronic applications. Incorporation of the siloxane moiety also lowers the moisture absorption.

UR - https://www.scopus.com/pages/publications/0025725856

M3 - Conference Paper published in a book

AN - SCOPUS:0025725856

SN - 0938994581

T3 - Electronic Materials: Technology, Here and Now

SP - 359

EP - 364

BT - Electronic Materials

PB - Publ by SAMPE

T2 - 5th Annual International Sampe Electronics Conference

Y2 - 18 June 1991 through 20 June 1991

ER -

Novel photosensitive polyimidesiloxanes

Abstract

Publication series

Conference

Other files and links

Fingerprint

Cite this