On the modeling of the current-voltage characteristics of a symmetrical double-gate metal-oxide-semiconductor field-effect transistor with an undoped body

Man Wong*, Xuejie Shi

*Corresponding author for this work

Research output: Contribution to conferenceConference Paperpeer-review

Abstract

Three general sets of solutions are formulated to model an arbitrarily configured double-gate (DG) metal-oxide-semiconductor (MOS) capacitor with an undoped silicon body under general bias conditions. The "zero-field" and the "zero-potential" solutions are separated by the "zero-field and zero-potential" solution. Based on the zero-field solution, approximate expressions are proposed to explicitly relate the potential (Ψs) and the electric field (Es) on the silicon side of the oxide/silicon interface of a symmetrical DG MOS capacitor. Based on these expressions, models of the threshold voltage and the current-voltage (IV) characteristics incorporating the mobility degradation effect at high "vertical" electric field and the velocity saturation effect at high "lateral" electric field of a symmetrical DG MOS field-effect transistor are developed. Comparisons are made among the presently proposed IV model, some previously proposed IV models and numerical simulations.

Original languageEnglish
Pages692-697
Number of pages6
Publication statusPublished - 2006
Event2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings - Boston, MA, United States
Duration: 7 May 200611 May 2006

Conference

Conference2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings
Country/TerritoryUnited States
CityBoston, MA
Period7/05/0611/05/06

Keywords

  • Current-voltage characteristics
  • Double-gate MOSFET
  • Modeling
  • Threshold voltage

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