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Parallel field magnetoresistance in topological insulator thin films

  • C. J. Lin*
  • , X. Y. He
  • , J. Liao
  • , X. X. Wang
  • , V. Sacksteder Iv
  • , W. M. Yang
  • , T. Guan
  • , Q. M. Zhang
  • , L. Gu
  • , G. Y. Zhang
  • , C. G. Zeng
  • , X. Dai
  • , K. H. Wu
  • , Y. Q. Li
  • *Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

We report that the finite thickness of three-dimensional topological insulator (TI) thin films produces an observable magnetoresistance (MR) in phase coherent transport in parallel magnetic fields. The MR data of Bi 2Se3 and (Bi1-xSbx) 2Te3 thin films are compared with existing theoretical models of parallel field magnetotransport. We conclude that the TI thin films bring parallel field transport into a unique regime in which the coupling of surface states to bulk and to opposite surfaces is indispensable for understanding the observed MR. The β parameter extracted from parallel field MR can in principle provide a figure of merit for searching TI compounds with more insulating bulk than existing materials.

Original languageEnglish
Article number041307
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume88
Issue number4
DOIs
Publication statusPublished - 22 Jul 2013
Externally publishedYes

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