Pentacene monolayer trapped between graphene and substrate

Qicheng Zhang, Boyu Peng, Paddy Kwok K.Leung Chan, Zhengtang Luo

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

Abstract

Self-Assembled pentacene monolayer can be fabricated between solid-solid interface of few-layer graphene (FLG) and mica substrate, through a diffusion-spreading method. By utilizing a transfer method that allows us to sandwich pentacene between graphene and mica, followed by controlled annealing, we enables the diffused pentacene to be trapped in the interfaces and lead to the formation of a stable monolayer. We found that the formation of monolayer is kinetically favored by using a 2D Ising lattice gas model for pentacene trapped between graphene-substrate interfaces. This kinetic Monte Carlo simulation results indicate that, due to the graphene substrate enclosure, the spreading of the first layer proceeds faster than the second layer, as the kinetics favors the filling of void by molecules from the second layer. This graphene assisted monolayer assembly method provides a new venue for fabrication of two-dimensional monolayer structures.

Original languageEnglish
Title of host publicationMaterials Engineering and Sciences Division 2015 - Core Programming Area at the 2015 AIChE Annual Meeting
PublisherAIChE
Pages606-619
Number of pages14
ISBN (Electronic)9781510818651
Publication statusPublished - 2015
EventMaterials Engineering and Sciences Division 2015 - Core Programming Area at the 2015 AIChE Annual Meeting - Salt Lake City, United States
Duration: 8 Nov 201513 Nov 2015

Publication series

NameMaterials Engineering and Sciences Division 2015 - Core Programming Area at the 2015 AIChE Annual Meeting

Conference

ConferenceMaterials Engineering and Sciences Division 2015 - Core Programming Area at the 2015 AIChE Annual Meeting
Country/TerritoryUnited States
CitySalt Lake City
Period8/11/1513/11/15

Bibliographical note

Publisher Copyright:
Copyright © 2015 American Institute of Chemical Engineers. All rights reserved.

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