Abstract
An above-threshold current model is presented by combining the effective channel mobility with the Pao-Sah model for undoped polycrystalline-silicon thin-film transistors. The analytical drain current model is derived by fitting the polynomial curve to the experimental low field effective mobility and applying the trapped-charge-effect parameters. The free-charge comparison results show that the density-of-trap-state parameters for the Pao-Sah model are more reasonable by considering the effective channel mobility. Good agreements are obtained by comparing the drain current model with the Pao-Sah model and experimental data.
| Original language | English |
|---|---|
| Article number | 6293872 |
| Pages (from-to) | 3130-3132 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 59 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 2012 |
Keywords
- drain current model
- effective channel mobility
- polycrystalline silicon (poly-Si)
- thin-film transistor (TFT)
- trap states
Fingerprint
Dive into the research topics of 'Polynomial-effective-channel-mobility-based above-threshold current model for undoped polycrystalline-silicon thin-film transistors consistent with Pao-Sah model'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver