Polynomial-effective-channel-mobility-based above-threshold current model for undoped polycrystalline-silicon thin-film transistors consistent with Pao-Sah model

Hongyu He*, Xueren Zheng, Jin He, Mansun Chan

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

An above-threshold current model is presented by combining the effective channel mobility with the Pao-Sah model for undoped polycrystalline-silicon thin-film transistors. The analytical drain current model is derived by fitting the polynomial curve to the experimental low field effective mobility and applying the trapped-charge-effect parameters. The free-charge comparison results show that the density-of-trap-state parameters for the Pao-Sah model are more reasonable by considering the effective channel mobility. Good agreements are obtained by comparing the drain current model with the Pao-Sah model and experimental data.

Original languageEnglish
Article number6293872
Pages (from-to)3130-3132
Number of pages3
JournalIEEE Transactions on Electron Devices
Volume59
Issue number11
DOIs
Publication statusPublished - 2012

Keywords

  • drain current model
  • effective channel mobility
  • polycrystalline silicon (poly-Si)
  • thin-film transistor (TFT)
  • trap states

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