Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Dong Seok Leem, Sungsoo Kim, Ji Whan Kim, Jung Inn Sohn, Angharad Edwards, Jingsong Huang, Xuhua Wang, Jang Joo Kim, Donal D.C. Bradley, John C. Demello

Research output: Contribution to journalJournal Articlepeer-review

19 Citations (Scopus)

Abstract

High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells.

Original languageEnglish
Pages (from-to)2530-2534
Number of pages5
JournalSmall
Volume6
Issue number22
DOIs
Publication statusPublished - 22 Nov 2010
Externally publishedYes

Keywords

  • carbon nanotubes
  • interlayer lithography
  • patterning
  • solar cells
  • spray-coating

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