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Rapid patterning of single-wall carbon nanotubes by interlayer lithography

  • Dong Seok Leem
  • , Sungsoo Kim
  • , Ji Whan Kim
  • , Jung Inn Sohn
  • , Angharad Edwards
  • , Jingsong Huang
  • , Xuhua Wang
  • , Jang Joo Kim
  • , Donal D.C. Bradley
  • , John C. Demello

Research output: Contribution to journalJournal Articlepeer-review

Abstract

High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells.

Original languageEnglish
Pages (from-to)2530-2534
Number of pages5
JournalSmall
Volume6
Issue number22
DOIs
Publication statusPublished - 22 Nov 2010
Externally publishedYes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • carbon nanotubes
  • interlayer lithography
  • patterning
  • solar cells
  • spray-coating

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