Recent Progress in the Development of Complementary Field-Effect Transistors

Mansun Chan, Shengdong Zhang

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

1 Citation (Scopus)

Abstract

The continuous scaling of semiconductor devices has driven significant advancements in the industry, but also introduced challenges such as short channel effects and higher metal resistance. This paper explores the development of Complementary Field-Effect Transistors (CFETs), which stack n-type and p-type FETs to enhance performance and reduce power consumption. The historical evolution, technical challenges, and future potential of CFETs are discussed, highlighting innovative processes like back-side power rail integration and the use of 2D materials for improved device efficiency.

Original languageEnglish
Title of host publication2024 IEEE 17th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2024
EditorsFan Ye, Xiaona Zhu, Ting Ao Tang
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350361834
DOIs
Publication statusPublished - 2024
Event17th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2024 - Zhuhai, China
Duration: 22 Oct 202425 Oct 2024

Publication series

Name2024 IEEE 17th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2024

Conference

Conference17th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2024
Country/TerritoryChina
CityZhuhai
Period22/10/2425/10/24

Bibliographical note

Publisher Copyright:
© 2024 IEEE.

Keywords

  • 2D transistor
  • CFET
  • nano-sheet (key words)
  • stacked transistors

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