Reduction of Negative-Bias Temperature Instability in Polycrystalline Silicon Thin-Film Transistors with Doped Active Channel

Research output: Contribution to conference › Conference Paper

Original language	English
Publication status	Published - Sept 2017
Event	Proceedings of the International Display Manufacturing Conference (IDMC) - Duration: 1 Sept 2017 → 1 Sept 2017

Conference	Proceedings of the International Display Manufacturing Conference (IDMC)
Period	1/09/17 → 1/09/17

Access to Document

@conference{89c63be923e04681ae15ae796bfc441c,

title = "Reduction of Negative-Bias Temperature Instability in Polycrystalline Silicon Thin-Film Transistors with Doped Active Channel",

author = "Rongsheng Chen and Kwok, \{Hoi Sing\} and Man Wong and Zhihe Xia and Meng Zhang and Wei Zhou",

year = "2017",

month = sep,

language = "English",

note = "Proceedings of the International Display Manufacturing Conference (IDMC) ; Conference date: 01-09-2017 Through 01-09-2017",

}

TY - CONF

T1 - Reduction of Negative-Bias Temperature Instability in Polycrystalline Silicon Thin-Film Transistors with Doped Active Channel

AU - Chen, Rongsheng

AU - Kwok, Hoi Sing

AU - Wong, Man

AU - Xia, Zhihe

AU - Zhang, Meng

AU - Zhou, Wei

PY - 2017/9

Y1 - 2017/9

M3 - Conference Paper

T2 - Proceedings of the International Display Manufacturing Conference (IDMC)

Y2 - 1 September 2017 through 1 September 2017

ER -