SewPCT: Sewing Pattern Reconstruction from Point Cloud with Transformer

Hao Tian, Yu Cao, P. Y. Mok*

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

Abstract

Sewing patterns are vital for garment production, comprising polygonal regions stitched together to create a garment. Recent research has focused on reconstructing sewing patterns for 3D garment modeling and manipulation. This paper introduces SewPCT, a novel approach that utilizes point cloud data to generate sewing patterns. It features a point cloud transformer and two predictors for determining panel shapes and stitching details. The transformer processes local and global geometric features, enabling the predictors to accurately determine panel shapes and stitching information. Additionally, we have developed Panel-Neighbor Embedding to improve local feature representation, enhance panel accuracy, and reduce Panel-L2 distance. A Panel-Attention mechanism is also proposed within SewPCT to capture geometric information more effectively from the point cloud input. Experimental results demonstrate that SewPCT surpasses our baseline method and NeuralTailor performance. Furthermore, quantitative analysis confirms that SewPCT achieves superior accuracy in sewing pattern construction over methods using 3D point cloud and single image inputs, as evidenced by its performance on the Panel-L2 metric.

Original languageEnglish
Title of host publicationAdvances in Computer Graphics - 41st Computer Graphics International Conference, CGI 2024, Proceedings
EditorsNadia Magnenat-Thalmann, Jinman Kim, Bin Sheng, Zhigang Deng, Daniel Thalmann, Ping Li
PublisherSpringer Science and Business Media Deutschland GmbH
Pages211-223
Number of pages13
ISBN (Print)9783031820205
DOIs
Publication statusPublished - 2025
Externally publishedYes
Event41st Computer Graphics International Conference, CGI 2024 - Geneva, Switzerland
Duration: 1 Jul 20245 Jul 2024

Publication series

NameLecture Notes in Computer Science
Volume15339 LNCS
ISSN (Print)0302-9743
ISSN (Electronic)1611-3349

Conference

Conference41st Computer Graphics International Conference, CGI 2024
Country/TerritorySwitzerland
CityGeneva
Period1/07/245/07/24

Bibliographical note

Publisher Copyright:
© The Author(s), under exclusive license to Springer Nature Switzerland AG 2025.

Keywords

  • Attention Mechanism
  • Geometry Deep Learning
  • Sewing Pattern Reconstruction

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