Silicon microdisplay with photo-alignment

B. L. Zhang*, K. K. Li, H. C. Huang, H. S. Kwok

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

Abstract

A reflective mode liquid crystal microdisplay is presented using photo-alignment technology. The alignment layer, SD1, was aligned by three-step UV exposure process and MTN 90° mode is chosen to evaluate the performance. The comparison shows that the photo-alignment is comparable with and even better than the rubbing method in some aspect, such as sharper RVC curve and higher contrast ratio.

Original languageEnglish
Title of host publicationProceedings of the 6th Chinese Optoelectronics Symposium, COES 2003
EditorsK. T. Chan, H. S. Kwok
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages228-230
Number of pages3
ISBN (Electronic)0780378873, 9780780378872
DOIs
Publication statusPublished - 2003
Event6th Chinese Optoelectronics Symposium, COES 2003 - Hong Kong, China
Duration: 12 Sept 200314 Sept 2003

Publication series

NameProceedings of the 6th Chinese Optoelectronics Symposium, COES 2003

Conference

Conference6th Chinese Optoelectronics Symposium, COES 2003
Country/TerritoryChina
CityHong Kong
Period12/09/0314/09/03

Bibliographical note

Publisher Copyright:
© 2003 IEEE.

Keywords

  • Active matrix liquid crystal displays
  • Active matrix technology
  • Crystallization
  • Integrated circuit technology
  • Liquid crystal on silicon
  • Microdisplays
  • Optical films
  • Optical polarization
  • Surface topography
  • Thin film transistors

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