Abstract
A reflective mode liquid crystal microdisplay is presented using photo-alignment technology. The alignment layer, SD1, was aligned by three-step UV exposure process and MTN 90° mode is chosen to evaluate the performance. The comparison shows that the photo-alignment is comparable with and even better than the rubbing method in some aspect, such as sharper RVC curve and higher contrast ratio.
| Original language | English |
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| Title of host publication | Proceedings of the 6th Chinese Optoelectronics Symposium, COES 2003 |
| Editors | K. T. Chan, H. S. Kwok |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 228-230 |
| Number of pages | 3 |
| ISBN (Electronic) | 0780378873, 9780780378872 |
| DOIs | |
| Publication status | Published - 2003 |
| Event | 6th Chinese Optoelectronics Symposium, COES 2003 - Hong Kong, China Duration: 12 Sept 2003 → 14 Sept 2003 |
Publication series
| Name | Proceedings of the 6th Chinese Optoelectronics Symposium, COES 2003 |
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Conference
| Conference | 6th Chinese Optoelectronics Symposium, COES 2003 |
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| Country/Territory | China |
| City | Hong Kong |
| Period | 12/09/03 → 14/09/03 |
Bibliographical note
Publisher Copyright:© 2003 IEEE.
Keywords
- Active matrix liquid crystal displays
- Active matrix technology
- Crystallization
- Integrated circuit technology
- Liquid crystal on silicon
- Microdisplays
- Optical films
- Optical polarization
- Surface topography
- Thin film transistors