SPC for a data-rich environment using profile techniques

Kaibo Wang*, Fugee Tsung

*Corresponding author for this work

Research output: Contribution to conferenceConference Paperpeer-review

Abstract

In modern manufacturing processes, huge sample size scenarios are becoming popular. Serious failure patterns that posses some local features, like partial mean or variance shifts, raise unique challenges for statistical process control (SPC). Conventional SPC methods monitoring the simple summary statistics are not an efficient way under such circumstances. Based on the study of a machine vision system example, we suggest characterizing each sample by a quantile-quantile (Q-Q) plot, and monitoring the linear profile generated from it. Profile monitoring techniques are implemented and studied. Simulation results show this an effective approach to handle this problem.

Original languageEnglish
Pages301-306
Number of pages6
Publication statusPublished - 2004
EventIIE Annual Conference and Exhibition 2004 - Houston, TX, United States
Duration: 15 May 200419 May 2004

Conference

ConferenceIIE Annual Conference and Exhibition 2004
Country/TerritoryUnited States
CityHouston, TX
Period15/05/0419/05/04

Keywords

  • Profile monitoring
  • Q-Q plot

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