Abstract
In modern manufacturing processes, huge sample size scenarios are becoming popular. Serious failure patterns that posses some local features, like partial mean or variance shifts, raise unique challenges for statistical process control (SPC). Conventional SPC methods monitoring the simple summary statistics are not an efficient way under such circumstances. Based on the study of a machine vision system example, we suggest characterizing each sample by a quantile-quantile (Q-Q) plot, and monitoring the linear profile generated from it. Profile monitoring techniques are implemented and studied. Simulation results show this an effective approach to handle this problem.
| Original language | English |
|---|---|
| Pages | 301-306 |
| Number of pages | 6 |
| Publication status | Published - 2004 |
| Event | IIE Annual Conference and Exhibition 2004 - Houston, TX, United States Duration: 15 May 2004 → 19 May 2004 |
Conference
| Conference | IIE Annual Conference and Exhibition 2004 |
|---|---|
| Country/Territory | United States |
| City | Houston, TX |
| Period | 15/05/04 → 19/05/04 |
Keywords
- Profile monitoring
- Q-Q plot