Step-Graded AlGaN vs superlattice: role of strain relief layer in dynamic on-resistance degradation

Xiaoguang He*, Yuxia Feng*, Xuelin Yang, Shan Wu, Zidong Cai, Jia Wei, Jianfei Shen, Huayang Huang, Danshuo Liu, Zhenghao Chen, Cheng Ma, Weikun Ge, Bo Shen

*Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

12 Citations (Scopus)

Abstract

In this work, we study the impacts of different types of strain relief layer (SRL) on dynamic on-resistance (R on) degradation of GaN power devices on Si by back-gate ramping and vertical leakage measurement. Our study reveals that the SRL has important effects on the dynamic R on. Compared with step-graded AlGaN SRL, the superlattice SRL possesses much more energy barriers, which can more effectively block the leakage of holes from GaN buffer and the injection of electrons from Si substrate. Enhancing the carrier blocking ability of SRL could contribute to the suppression of dynamic R on degradation.

Original languageEnglish
Article number011001
JournalApplied Physics Express
Volume15
Issue number1
DOIs
Publication statusPublished - Jan 2022
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2021 The Japan Society of Applied Physics

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