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The doping of mercury cadmium telluride grown by molecular-beam epitaxy

  • M. Boukerche
  • , P. S. Wijewarnasuriya
  • , S. Sivananthan
  • , I. K. Sou
  • , Y. J. Kim
  • , K. K. Mahavadi
  • , J. P. Faurie

Research output: Contribution to journalJournal Articlepeer-review

Abstract

The electrical properties of the mercury cadmium telluride semiconductor material grown by the molecular-beam epitaxy are reviewed. The doping effects linked to the growth conditions, as well as the influence of indium or lithium incorporation are discussed. The results on doping by silicon, arsenic, and antimony are presented. It will be shown that all the impurities studied interact primarily with the metal site. It will confirm that the growth occurs under very rich tellurium conditions.

Original languageEnglish
Pages (from-to)2830-2833
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume6
Issue number4
DOIs
Publication statusPublished - Jul 1988
Externally publishedYes

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