The role of H-plasma in aluminum induced crystallization of amorphous silicon

Chong Luo, Juan Li, He Li, Zhiguo Meng, Qian Huang, Shengzhi Xu, Hoi Sing Kwok, Shaozhen Xiong*

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

Abstract

A technique to improve and accelerate aluminum induced crystallization (AIC) by hydrogen plasma is proposed in this paper. Raman spectroscopy and Secondary Ion Mass Spectrometry of crystallized poly-Si thin films show that hydrogen plasma radicals reduce the crystallization time of AIC. This technique shortens the annealing time from 10 hours to 4 hours and increases the Hall mobility from 22.1 cm 2/V•s to 42.5 cm 2/V•s. The possible mechanism of AIC assisted by hydrogen radicals will also be discussed.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011
Pages191-196
Number of pages6
DOIs
Publication statusPublished - 2012
Event2011 MRS Spring Meeting - San Francisco, CA, United States
Duration: 25 Apr 201129 Apr 2011

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1321
ISSN (Print)0272-9172

Conference

Conference2011 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period25/04/1129/04/11

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