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UIS analysis and characterization of the inverted L-shaped source trench power MOSFET

  • Jacky C.W. Ng*
  • , Johnny K.O. Sin
  • , Hitoshi Sumida
  • , Yoshiaki Toyoda
  • , Akihiko Ohi
  • , Hiroyuki Tanaka
  • , Takeyoshi Nishimura
  • , Katsunori Ueno
  • *Corresponding author for this work

Research output: Contribution to journalJournal Articlepeer-review

Abstract

In this paper, the unclamped inductive switching (UIS) behavior of an inverted L-shaped source trench power MOSFET is numerically analyzed and experimentally characterized. The measured avalanche energy absorption at UIS of the new trench power MOSFET is 2.1 times that of the conventional trench power MOSFET. This is explained by numerical simulation, which shows that the voltage drop across the emitter/base junction in the parasitic bipolar junction transistor of the new structure is smaller than that of the conventional structure. The influence of structural and device size variation of the new trench power MOSFET on UIS performance is also investigated. Results show that the avalanche current density at UIS is a strong function of the p +-region width and the device size. Furthermore, the effect becomes very significant as the device size becomes very small.

Original languageEnglish
Article number6016231
Pages (from-to)3984-3990
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume58
Issue number11
DOIs
Publication statusPublished - Nov 2011

Keywords

  • Avalanche current
  • avalanche ruggedness
  • energy absorption
  • trench power MOSFET
  • unclamped inductive switching (UIS)

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