Ultrathin chromium oxide films on the W(100) surface

Donghui Guo; Qinlin Guo; M. S. Altman; E. G. Wang

doi:10.1021/jp054460w

Ultrathin chromium oxide films on the W(100) surface

Donghui Guo
, Qinlin Guo^*
, M. S. Altman
, E. G. Wang

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Journal Article › peer-review

13 Citations (Scopus)

Abstract

Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO₂ is formed by oxidizing pre-deposited Cr at 300-320 K in ∼10^-7 mbar oxygen. However, an increase of temperature causes formation of Cr₂O₃. At Cr coverage above 1 monolayer, only Cr₂O₃ is detected.

Original language	English
Pages (from-to)	20968-20972
Number of pages	5
Journal	Journal of Physical Chemistry B
Volume	109
Issue number	44
DOIs	https://doi.org/10.1021/jp054460w
Publication status	Published - 10 Nov 2005

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title = "Ultrathin chromium oxide films on the W(100) surface",

abstract = "Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in ∼10-7 mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above 1 monolayer, only Cr2O3 is detected.",

author = "Donghui Guo and Qinlin Guo and Altman, \{M. S.\} and Wang, \{E. G.\}",

year = "2005",

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doi = "10.1021/jp054460w",

language = "English",

volume = "109",

pages = "20968--20972",

journal = "Journal of Physical Chemistry B",

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publisher = "American Chemical Society",

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TY - JOUR

T1 - Ultrathin chromium oxide films on the W(100) surface

AU - Guo, Donghui

AU - Guo, Qinlin

AU - Altman, M. S.

AU - Wang, E. G.

PY - 2005/11/10

Y1 - 2005/11/10

N2 - Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in ∼10-7 mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above 1 monolayer, only Cr2O3 is detected.

AB - Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in ∼10-7 mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above 1 monolayer, only Cr2O3 is detected.

UR - https://www.webofscience.com/wos/woscc/full-record/WOS:000233342400045

UR - https://openalex.org/W2062831141

U2 - 10.1021/jp054460w

DO - 10.1021/jp054460w

M3 - Journal Article

SN - 1520-6106

VL - 109

SP - 20968

EP - 20972

JO - Journal of Physical Chemistry B

JF - Journal of Physical Chemistry B

IS - 44

ER -

Ultrathin chromium oxide films on the W(100) surface

Abstract

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