TY - JOUR
T1 - Ultrathin chromium oxide films on the W(100) surface
AU - Guo, Donghui
AU - Guo, Qinlin
AU - Altman, M. S.
AU - Wang, E. G.
PY - 2005/11/10
Y1 - 2005/11/10
N2 - Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in ∼10-7 mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above 1 monolayer, only Cr2O3 is detected.
AB - Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in ∼10-7 mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above 1 monolayer, only Cr2O3 is detected.
UR - https://www.webofscience.com/wos/woscc/full-record/WOS:000233342400045
UR - https://openalex.org/W2062831141
UR - https://www.scopus.com/pages/publications/28144454781
U2 - 10.1021/jp054460w
DO - 10.1021/jp054460w
M3 - Journal Article
SN - 1520-6106
VL - 109
SP - 20968
EP - 20972
JO - Journal of Physical Chemistry B
JF - Journal of Physical Chemistry B
IS - 44
ER -